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| AMMONIA
NH3
|
ARGON
Ar
|
Arsine
AsH©ý
|
Boron
Trichloride
BCl3
|
Carbon
Dioxide CO2
|
| Chlorine
Cl2
|
Chlorine
Trifluoride
ClF©ý
|
Disilane
SiH©üCl©ü
|
Disilane
Si2H6
|
Germane
GeH4
|
| Halocarbon
14
CF4
|
Halocarbon
23
CHF3
|
Halocarbon
116 C2F6
|
Halocarbon
C318 C4F8
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Helium
He
|
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Hydrogen
H2
|
Hydrogen
Bromide
HBr
|
Hydrogen
Chloride
HCl
|
Hydrogen
Fluoride
HF
|
Hydrogen
Selenide
H2Se
|
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Methyl Fluoride
CH3F
|
Nitrogen
N2
|
Nitrogen
Trifluoride
NF3
|
Nitrous Oxide
N2O
|
Oxygen
O2
|
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Perfluoropropane
C3F8
|
Phosphine
PH3
|
Phosphorous
Pentafluoride
PF5
|
Silane
SiH4
|
Silicon Tetrachloride
SiCl4
|
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Silicon Tetrafluoride
SiF4
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Sulfur
Hexafluoride
SF6
|
Tirchlorosilane
SiHCl3
|
Tungsten
Hexafluoride
WF6
|
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Arsine
in Semiconductor
Purity Background
Gas
AsH3/Ar,
He, H2, N2 BAL
|
Diborane
in Semiconductor
Purity Background
Gas
B2H6/Ar,
He, H2, N2 BAL
|
|
Phosphine
in Semiconductor
Purity Background
Gas
PH3/Ar,
He, H2, N2 BAL
|
Silicon
in Semiconductor
Purity Background
Gas
SiH4/Ar,
He, H2, N2 BAL
|
|
Silicon
Tetrafluoride/Oxygen
Scl4/O2 BAL
|
Halocarbon
14/Oxygen Mixtures
CF4/O2 BAL
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Office